DESIGN AND TESTS OF THE NEW PARTIALLY-IONIZED BEAM SOURCE

We developed and evaluated a new partially ionized beam (PIB) source t o deposit high quality Cu films. The novelty of the PIB source lies in the fact that the crucible and ionization parts are spaced in one cyl indrical shell to make its structure compact and to get a uniform beam profile, but their electric circuits are not separated. In this artic le, we report the characteristics of the PIB source, such as voltage-a mpere characteristics of the crucible and ionization parts, Cu+ ion be am uniformity with a change of the ionization currents, and deposition rate. (C) 1996 American Institute of Physics.