An. Nazarov et al., QUANTUM-CHEMICAL INVESTIGATIONS OF ATOMIC-HYDROGEN EFFECT ON FRENKEL PAIRS ANNIHILATION IN SILICON, Modelling and simulation in materials science and engineering, 4(3), 1996, pp. 323-333
The SCF MO LCAO method in the valence approach with neglect of diatomi
c differential overlap (NDDO) is used to study the effect of atomic hy
drogen on the silicon lattice relaxation in the nearest vicinity of a
vacancy. It is shown that hydrogen atoms are localized mainly as secon
d-nearest neighbours of the vacancies on the Si-Si bond, which results
in a significant extension of the vacancy region. The potential barri
er height and its dependence on the vacancy charge state were calculat
ed for Frenkel pair annihilation with a hydrogenated vacancy in the ca
ses of hydrogen localization inside and outside the vacancy. The resul
ts substantiate a model of enhanced annihilation of Frenkel pairs in h
ydrogenated crystalline Si.