SPECTROSCOPIC ELLIPSOMETRY FOR PROCESS APPLICATIONS

Spectroscopic ellipsometry has become an essential metrology tool for the semiconductor industry. It is widely used where precise film thick nesses and optical constants are required. Faster measurement speeds a re opening new doors for ellipsometry in thin-film processing environm ents, primarily due to its ability to maintain high precision when mea suring very thin or multilayered films (such as gate oxides). The tech nique works well for all varieties of films, including semiconductors, dielectrics, metals, and polymer coatings.