Large arrays of parallel metallic nanowires ranging from 20-120 nm in
width are fabricated using a general and relatively simple technique.
Holographic laser interference exposure of photoresist and anisotropic
etching are used to pattern the surface of InP(001) substrates into V
-shaped grooves of 200 nm period. Subsequently metal is evaporated at
an angle onto the V-grooved substrates, naturally resulting in thousan
ds of ultra-narrow metallic wires in parallel. Resistance measurements
proof that as-prepared wires are electrically continuous.