SMOOTH MONOLAYER AS-TERMINATED AND GA-TERMINATED GAAS(100) SURFACES

Citation
Mh. Tsai et al., SMOOTH MONOLAYER AS-TERMINATED AND GA-TERMINATED GAAS(100) SURFACES, Physical review. B, Condensed matter, 54(11), 1996, pp. 7637-7639
Citations number
30
Categorie Soggetti
Physics, Condensed Matter
ISSN journal
01631829
Volume
54
Issue
11
Year of publication
1996
Pages
7637 - 7639
Database
ISI
SICI code
0163-1829(1996)54:11<7637:SMAAGG>2.0.ZU;2-X
Abstract
Recent layer-by-layer migration enhanced epitaxy growth of high qualit y GaAs(100) films at low temperatures suggested that smooth missing-di mer-free monolayer As- and Ga-terminated surfaces are attainable durin g the growth process or the grown films will contain a high concentrat ion of antisite defects. Using the local-orbital density-functional mo lecular-dynamics method, we find that the smooth monolayer As-terminat ed surface may be the (2x4) surface with a three-dimer unit and a shif ted dimer. The smooth monolayer Ga-terminated surface may be the (1x2) dimerized surface.