Recent layer-by-layer migration enhanced epitaxy growth of high qualit
y GaAs(100) films at low temperatures suggested that smooth missing-di
mer-free monolayer As- and Ga-terminated surfaces are attainable durin
g the growth process or the grown films will contain a high concentrat
ion of antisite defects. Using the local-orbital density-functional mo
lecular-dynamics method, we find that the smooth monolayer As-terminat
ed surface may be the (2x4) surface with a three-dimer unit and a shif
ted dimer. The smooth monolayer Ga-terminated surface may be the (1x2)
dimerized surface.