Maa. Rahim et al., ANION INCORPORATION AND ITS EFFECT ON THE DIELECTRIC-CONSTANT AND GROWTH-RATE OF ZIRCONIUM-OXIDES, Journal of Applied Electrochemistry, 26(10), 1996, pp. 1037-1043
Mechanically polished zirconium electrodes were potentiodynamically po
larized in phosphate buffer solutions of various pH values and in 0.5
M NaOH. The results show that the shape of the I-E curves is independe
nt of the solution pH. At relatively low scan rates, oxygen gas evolut
ion was observed. The oxide film thickness was calculated from the val
ues of the charge consumed in the anodic process assuming 100% current
efficiency for oxide formation below oxygen evolution (lower values f
or the current efficiency are assumed for potentials above oxygen evol
ution). Capacitance measurements, together with the calculated oxide t
hickness, were used to estimate values for the dielectric constant of
the oxide. Two different values of the dielectric constant were obtain
ed for the oxides formed in the range of potential below and above oxy
gen evolution. Also, higher dielectric constant values were obtained w
ith increasing solution pH. Anion incorporation was assumed to increas
e the conductivity of the oxide films and, hence, decrease the dielect
ric constant. A two-layer structure is proposed for the anodically for
med oxide on zirconium in aqueous solutions; an anion-fi-ee layer near
the metal and an outer layer containing the incorporated anions.