THICKNESS VARIATIONS IN AMORPHOUS AS2S3 FILMS INDUCED BY ELECTRON-BEAM

Authors
NORDMAN N SALMINEN O
Citation
N. Nordman et O. Salminen, THICKNESS VARIATIONS IN AMORPHOUS AS2S3 FILMS INDUCED BY ELECTRON-BEAM, Solid state communications, 100(4), 1996, pp. 241-244
Citations number
24
Categorie Soggetti
Physics, Condensed Matter
Journal title
Solid state communications → ACNP
ISSN journal
00381098
Volume
100
Issue
4
Year of publication
1996
Pages
241 - 244
Database
ISI
SICI code
0038-1098(1996)100:4<241:TVIAAF>2.0.ZU;2-M
Abstract
We have found that the thickness of the as evaporated, thermally relax ed As2S3 films decreases when they are exposed to an electron beam. Th e surface variations depend exponentially on the electron dose. The ma ximum of the surface contraction is over 20 nm when a film with the th ickness of 11 mu m is used. Copyright (C) 1996 Elsevier Science Ltd