PLASMA SOURCE ION-IMPLANTATION OF METAL-IONS - SYNCHRONIZATION OF CATHODIC-ARC PLASMA PRODUCTION AND TARGET BIAS PULSES

An erbium cathodic-arc has been installed on a plasma source ion impla ntation (PSII) experiment to allow the implantation of erbium metal an d the growth of adherent erbia (erbium oxide) films on a variety of su bstrates. The operation of the PSII pulser and the cathodic-arc are sy nchronized to achieve pure implantation, rather than the hybrid implan tation/deposition being investigated in other laboratories. The relati ve phase of the 20 mu s PSII and the cathodic-arc pulses can be adjust ed to tailor the energy distribution of the implanted ions and suppres s the initial high-current drain on the pulse modulator. We present ex perimental data on this effect and make a comparison with the results from particle-in-cell simulations.