PLASMA SOURCE ION-IMPLANTATION PROJECT AT SOUTHWESTERN-INSTITUTE-OF-PHYSICS

Citation
Zk. Shang et al., PLASMA SOURCE ION-IMPLANTATION PROJECT AT SOUTHWESTERN-INSTITUTE-OF-PHYSICS, Surface & coatings technology, 85(1-2), 1996, pp. 105-110
Citations number
4
Categorie Soggetti
Materials Science, Coatings & Films
ISSN journal
02578972
Volume
85
Issue
1-2
Year of publication
1996
Pages
105 - 110
Database
ISI
SICI code
0257-8972(1996)85:1-2<105:PSIPAS>2.0.ZU;2-Z
Abstract
The characteristics and use of the first plasma source ion implantatio n (PSII) device (PSII-EX) put into operation in the Southwestern Insti tute of Physics (SWIP) in 1993 are described. Experiments performed wi th this device have demonstrated its use for achieving good uniform su rface-modification properties of materials via ion implantation. These properties include improvements in surface microhardness, friction an d the biological compatibility of Ti alloy materials. In addition, PSI I treatment of practical workpieces, such as cutting tools, measuring tools and bearings, have also led to substantial improvements in wear life. Surface analyses of treated samples have been performed using TE M, AES, XPS and RES. Computer simulation of the PSII process has been used to assist our research. PSII technology is being developed for in dustrial and commercial applications via a novel industrial PSII machi ne and new modification techniques that are being developed using this machine at SWIP.