The characteristics and use of the first plasma source ion implantatio
n (PSII) device (PSII-EX) put into operation in the Southwestern Insti
tute of Physics (SWIP) in 1993 are described. Experiments performed wi
th this device have demonstrated its use for achieving good uniform su
rface-modification properties of materials via ion implantation. These
properties include improvements in surface microhardness, friction an
d the biological compatibility of Ti alloy materials. In addition, PSI
I treatment of practical workpieces, such as cutting tools, measuring
tools and bearings, have also led to substantial improvements in wear
life. Surface analyses of treated samples have been performed using TE
M, AES, XPS and RES. Computer simulation of the PSII process has been
used to assist our research. PSII technology is being developed for in
dustrial and commercial applications via a novel industrial PSII machi
ne and new modification techniques that are being developed using this
machine at SWIP.