GIANT OSCILLATIONS OF COUPLING STRENGTH ON MO SI MULTILAYERS WITH THECONSTANT THICKNESS OF SEMICONDUCTOR LAYERS/

Citation
Ny. Fogel et al., GIANT OSCILLATIONS OF COUPLING STRENGTH ON MO SI MULTILAYERS WITH THECONSTANT THICKNESS OF SEMICONDUCTOR LAYERS/, Czechoslovak journal of Physics, 46, 1996, pp. 731-732
Citations number
5
Categorie Soggetti
Physics
ISSN journal
00114626
Volume
46
Year of publication
1996
Supplement
2
Pages
731 - 732
Database
ISI
SICI code
0011-4626(1996)46:<731:GOOCSO>2.0.ZU;2-K
Abstract
We report the observation of anisotropy ratio gamma and interlayer cou pling strength oscillations with variation of metal layer thickness on Mo/Si multilayer series with constant Si layer thickness. These oscil lations correlate with previously found oscillations of T-c, R(300)/R( n) and dH(c perpendicular to)/dT. The giant amplitude of gamma oscilla tions makes one to believe that all oscillation effects are due to the variation of the Josephson coupling strength. Possible origin of thes e unusual effects is discussed.