Ny. Fogel et al., GIANT OSCILLATIONS OF COUPLING STRENGTH ON MO SI MULTILAYERS WITH THECONSTANT THICKNESS OF SEMICONDUCTOR LAYERS/, Czechoslovak journal of Physics, 46, 1996, pp. 731-732
We report the observation of anisotropy ratio gamma and interlayer cou
pling strength oscillations with variation of metal layer thickness on
Mo/Si multilayer series with constant Si layer thickness. These oscil
lations correlate with previously found oscillations of T-c, R(300)/R(
n) and dH(c perpendicular to)/dT. The giant amplitude of gamma oscilla
tions makes one to believe that all oscillation effects are due to the
variation of the Josephson coupling strength. Possible origin of thes
e unusual effects is discussed.