MICRO-DISCHARGE NOISE AND RADIATION-DAMAGE OF SILICON MICROSTRIP SENSORS

Citation
T. Ohsugi et al., MICRO-DISCHARGE NOISE AND RADIATION-DAMAGE OF SILICON MICROSTRIP SENSORS, Nuclear instruments & methods in physics research. Section A, Accelerators, spectrometers, detectors and associated equipment, 383(1), 1996, pp. 166-173
Citations number
7
Categorie Soggetti
Nuclear Sciences & Tecnology","Physics, Particles & Fields","Instument & Instrumentation",Spectroscopy
ISSN journal
01689002
Volume
383
Issue
1
Year of publication
1996
Pages
166 - 173
Database
ISI
SICI code
0168-9002(1996)383:1<166:MNAROS>2.0.ZU;2-4
Abstract
We have examined experimentally some existing ideas for improving the radiation hardness of silicon microstrip sensors. We confirm that the extended electrode and the deep implant-strip proposed on the basis of simulation studies works effectively to suppress micro-discharge as w ell as junction breakdown of the bias or guard ring. For an integrated coupling capacitor a double layer structure of SiO2 and Si3N4 provide s better radiation hardness than that of single SiO2 coupling in our d esign conditions. The onset voltage of the micro-discharge on the bias /guard ring has been studied for an extended electrode and a floating guard ring.