We have examined sputtered metal/Al2O3 multilayers (metal: Co, Pt, W)
with respect to their suitability as x-ray mirrors in high temperature
environments. The rf-sputtering technique leads to layered structures
with interface roughnesses of only 0.2 nm as confirmed by x-ray scatt
ering and transmission electron microscopy. In situ resistance measure
ments characterize the percolation process and indicate the lower thic
kness limits for the chosen materials which lead to minimum modulation
periods of approximate to 2 nm. The samples were characterized after
stepwise annealing up to 1000 degrees C. Reflectivity values of nearly
100% at the first satellite-reflection were found in the case of Pt a
nd W (for lambda = 0.15418 nm). The most stable W/Al2O3 multilayer ref
lects 70% of the primary beam even after annealing at 900 degrees C. (
C) 1996 American Institute of Physics.