MICROSTRUCTURE AND MAGNETISM IN FETAN FILMS DEPOSITED IN THE NANOCRYSTALLINE STATE

Citation
B. Viala et al., MICROSTRUCTURE AND MAGNETISM IN FETAN FILMS DEPOSITED IN THE NANOCRYSTALLINE STATE, Journal of applied physics, 80(7), 1996, pp. 3941-3956
Citations number
42
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
80
Issue
7
Year of publication
1996
Pages
3941 - 3956
Database
ISI
SICI code
0021-8979(1996)80:7<3941:MAMIFF>2.0.ZU;2-R
Abstract
As-deposited, magnetically soft nanocrystalline FeTaN films are succes sfully grown by dc-magnetron reactive sputtering. Growth conditions ar e instrumental in extending the solubility limit of Ta in the bcc FeTa alloy. Nitrogen incorporation in FeTa films is found to be much highe r than in Fe films and can be explained in terms of thermochemistry us ing a large Ta-N interaction coefficient. The influence of different a lloying elements is discussed theoretically, with regard to the metal- nitrogen affinity. A ''typical columnar microstructure'' associated wi th the sputtering process is identified and its evolution versus the e xtent of nitrogenation is described in detail. Stress, magnetostrictio n, resistivity, and magnetic properties are respectively described as a function of both Ta and N contents of the films. The magnetic behavi or of as-deposited nanocrystalline FeTaN is found to be very sensitive to both the dimension of the grains, their morph7ology and the nature of the grain boundary material which represents a non-negligible volu me fraction in nanocrystalline films. It is proposed that the columnar structure plays the key role in promoting perpendicular anisotropy co mponent (K-perpendicular to) and controls a ''Stripe Domain'' like beh avior observed at high N contents, which cannot be explained in terms of film stress in this material. The contribution of the magnetoelasti c anisotropy is also described. In summary, by breaking the columnar s tructure? the incorporation of nitrogen first decreases K-perpendicula r to below the critical limit for formation of stripe domains. In thes e conditions, N acts as a ''grain refiner'' and excellent soft magneti c behavior is reported and explained in terms of ''vanishing magnetocr ystalline anisotropy.'' The good thermal stability of such soft films is confirmed. By contrast, higher nitrogen incorporation increases K-p erpendicular to above the critical limit, leading to a stable stripe d omain-like structure which does not allow for soft magnetic properties . This phenomenon has been found to be reversible at low temperature w here a complete restoration of the soft magnetic behavior has been obs erved. This anomalous result is explained by the transformation of the grain boundary material into a ''low Curie temperature phase'' for la rge N contents. (C) 1996 American Institute of Physics.