THERMAL-STABILITY OF SULFUR-TREATED INP INVESTIGATED BY PHOTOLUMINESCENCE

Citation
Ik. Han et al., THERMAL-STABILITY OF SULFUR-TREATED INP INVESTIGATED BY PHOTOLUMINESCENCE, Journal of applied physics, 80(7), 1996, pp. 4052-4057
Citations number
30
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
80
Issue
7
Year of publication
1996
Pages
4052 - 4057
Database
ISI
SICI code
0021-8979(1996)80:7<4052:TOSIIB>2.0.ZU;2-K
Abstract
The effect of sulfur (S) treatments on InP is investigated by low-temp erature photoluminescence (PL) measurements. For both n- and p-InP, th e PL intensity is observed to increase about four times in magnitude i f the scattering by Ihs: S overlayer is relatively small. Some PL band s are observed to disappear after S treatments and then reappear if th e S-treated surface is heat treated at 220 degrees C in a vacuum of 10 (-3) Torr. By observing their dependence on the excitation power densi ty, the doping level of the samples, and measurement temperature, thes e PL bands are ascribed to the optical transitions via surface states. Our results thus indicate that the S-treated InP surface may not be s table al a subsequent processing temperature of about 250 degrees C. ( C) 1996 American Institute of Physics.