ELECTRICAL-PROPERTIES OF LAYER SEMICONDUCTOR P-GASE DOPED WITH CU

Citation
S. Shigetomi et al., ELECTRICAL-PROPERTIES OF LAYER SEMICONDUCTOR P-GASE DOPED WITH CU, Journal of applied physics, 80(8), 1996, pp. 4779-4781
Citations number
10
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
80
Issue
8
Year of publication
1996
Pages
4779 - 4781
Database
ISI
SICI code
0021-8979(1996)80:8<4779:EOLSPD>2.0.ZU;2-D
Abstract
Measurements of Hall effect and deep-level transient spectroscopy have been made on Cu-doped p-GaSe. The moderately deep acceptor and shallo w acceptor levels located at 0.13 and 0.04 eV above the valence band a re obtained from the temperature dependence of the hole concentration. The hole-trapping level at 0.14 eV above the valence band is detected by deep-level transient spectroscopy and shows almost the same positi on as the moderately deep acceptor level. We find that the shallow acc eptor level of 0.04 eV is attributed to Cu atoms, whereas the moderate ly deep acceptor level of 0.13 eV is governed by the defects or defect complexes. (C) 1995 American Institute of Physics.