H. Presting et al., ROOM-TEMPERATURE ELECTROLUMINESCENCE FROM SI GE/SI1-XGEX QUANTUM-WELLDIODES GROWN BY MOLECULAR-BEAM EPITAXY/, Applied physics letters, 69(16), 1996, pp. 2376-2378
Tunable room-temperature electroluminescence, photocurrent, and photol
uminescence in the near infrared (lambda-1.3 mu m) has been observed f
rom Ge/Si/Ge/Si1-xGex quantum-well (QW) diodes grown by molecular-beam
epitaxy. The QWs are grown on a p(+)-doped (100)-Si substrate and con
sist of two thin Ge wells separated by a thicker Si middle layer, and
the whole structure is embedded by two S0.85Ge0.15 ahoy layers. Our th
eoretical analysis of the data suggests that the strength of the spect
ra is linked to states localized at the interface. (C) 1996 American I
nstitute of Physics.