M. Czapkiewicz et al., INTERFACE STRUCTURE AND MAGNETIC AND ELECTRICAL-PROPERTIES OF FE TI MULTILAYERS/, Journal of magnetism and magnetic materials, 160, 1996, pp. 357-358
The interface structure of Fe/Ti multilayer films prepared by the rf s
puttering technique was studied by XRD. It was found from diffraction,
electrical conductivity and coercivity measurements that the amorphou
s phase is formed during deposition and is distributed in the plane be
tween the crystalline sublayers as well as in the grain boundaries.