L. Sun et al., (001) TEXTURED PBTIO3 THIN-FILMS GROWN ON REDOPING N-SI BY METALORGANIC CHEMICAL-VAPOR-DEPOSITION UNDER REDUCED PRESSURE, Applied physics A: Materials science & processing, 63(4), 1996, pp. 381-384
(001) textured PbTiO3 thin films have been deposited on (001) redoping
n-Si substrates by metalorgnic chemical vapor deposition (MOCVD) unde
r reduced pressure, and the film ferroelectricity has been measured us
ing the substrate as bottom electrode directly. Besides this investiga
tion, a set of analysis including AFM surface morphology, SEM cross se
ction morphology, electron-probe element analysis, XRD theta-2 theta s
can and high temperature X-ray diffraction have been carried out to st
udy the microstructure and phase transition process of the PbTiO3 thin
film.