ION-INDUCED DENSIFICATION OF PVD FILMS - A CHOICE OF THE OPTIMUM DENSITY OF ION-BOMBARDMENT

Authors
GRIGOROV GI GRIGOROV KG SPORKEN R CAUDANO R
Citation
Gi. Grigorov et al., ION-INDUCED DENSIFICATION OF PVD FILMS - A CHOICE OF THE OPTIMUM DENSITY OF ION-BOMBARDMENT, Applied physics A: Materials science & processing, 63(4), 1996, pp. 399-401
Citations number
13
Categorie Soggetti
Physics, Applied
Journal title
Applied physics A: Materials science & processing → ACNP
ISSN journal
09478396
Volume
63
Issue
4
Year of publication
1996
Pages
399 - 401
Database
ISI
SICI code
0947-8396(1996)63:4<399:IDOPF->2.0.ZU;2-#
Abstract
The densification process by ion-assisted physical vapour deposition o f films is considered as a consequence of rearrangement of atoms in th e near-surface film layer. A model is proposed allowing the quantitati ve estimate of the optimum ion current density required to produce a f ilm with maximum density.