U. Hofer, NONLINEAR-OPTICAL INVESTIGATIONS OF THE DYNAMICS OF HYDROGEN INTERACTION WITH SILICON SURFACES, Applied physics A: Materials science & processing, 63(6), 1996, pp. 533-547
Optical second-harmonic generation (SHG) from silicon surfaces may be
resonantly enhanced by dangling-bond-derived surface states. The resul
ting high sensitivity to hydrogen adsorption combined with unique feat
ures of SHG as an optical probe has been exploited to study various ki
netical and dynamical aspects of the adsorption system H-2/Si. Studies
of surface diffusion of H/Si(111)7x7 and recombinative desorption of
hydrogen from Si(111)7x7 and Si(100)2x1 revealed that the covalent nat
ure of hydrogen bonding on silicon surfaces leads to high diffusion ba
rriers and to desorption kinetics that strongly depend on the surface
structure. Recently, dissociative adsorption of molecular hydrogen on
Si(100)2x1 and Si(111)7x7 could be observed for the first time by heat
ing the surfaces to temperatures between 550 K and 1050 K and monitori
ng the SH response during exposure to a high flux of H-2 or D-2. The m
easured initial sticking coefficients for a gas temperature of 300 K r
ange from 10(-9) to 10(-5) and strongly increase as a function of surf
ace temperature. These results demonstrate that the lattice degrees of
freedom may play a decisive role in the reaction dynamics on semicond
uctor surfaces.