Yj. Wan et Jg. Verkade, [SI(HNCH2CH2)(2)(NCH2CH2)N](2) - A NOVEL PRODUCT OF HYDROGEN ELIMINATION FROM HSI(HNCH2CH2)(3)N, Organometallics, 15(26), 1996, pp. 5769-5771
Rather than oligomers, the title dimer is formed in high yield by dehy
drogenation of HSi(HNCH2CH2)(3)N under a variety of conditions ranging
from 77% by pyrolysis at 200 degrees C to 95% by dimerization in liqu
id ammonia in the presence of a catalytic amount of NaNH2. The structu
re of the dimer was confirmed by X-ray crystallographic studies.