D. Sander et al., HIGH COERCIVE FIELD AND FILM STRESS FOR EPITAXIAL MONOLAYERS OF FE ONW(110), IEEE transactions on magnetics, 32(5), 1996, pp. 4570-4572
Elastic and magnetic properties of ultrathin iron films on tungsten(11
0) are investigated. In situ film stress measurements during growth sh
ow stress values of 25 GPa per deposited monolayer. Our experiments in
dicate that the tremendous film stress triggers the formation of a mis
fit dislocation network at a coverage of 1.5 monolayers, The effect of
the film stress and its spatial variation on the magnetic behavior ar
e discussed, We find an high coercivity of order 0.3 T for 1.5 monolay
er thick films, A model is presented that explains the high coercivity
in terms of strong domain wall pinning.