HIGH COERCIVE FIELD AND FILM STRESS FOR EPITAXIAL MONOLAYERS OF FE ONW(110)

Citation
D. Sander et al., HIGH COERCIVE FIELD AND FILM STRESS FOR EPITAXIAL MONOLAYERS OF FE ONW(110), IEEE transactions on magnetics, 32(5), 1996, pp. 4570-4572
Citations number
12
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied
ISSN journal
00189464
Volume
32
Issue
5
Year of publication
1996
Part
2
Pages
4570 - 4572
Database
ISI
SICI code
0018-9464(1996)32:5<4570:HCFAFS>2.0.ZU;2-5
Abstract
Elastic and magnetic properties of ultrathin iron films on tungsten(11 0) are investigated. In situ film stress measurements during growth sh ow stress values of 25 GPa per deposited monolayer. Our experiments in dicate that the tremendous film stress triggers the formation of a mis fit dislocation network at a coverage of 1.5 monolayers, The effect of the film stress and its spatial variation on the magnetic behavior ar e discussed, We find an high coercivity of order 0.3 T for 1.5 monolay er thick films, A model is presented that explains the high coercivity in terms of strong domain wall pinning.