EXPOSURE SCHEDULE FOR MULTIPLEXING HOLOGRAMS IN PHOTOPOLYMER FILMS

Citation
A. Pu et al., EXPOSURE SCHEDULE FOR MULTIPLEXING HOLOGRAMS IN PHOTOPOLYMER FILMS, Optical engineering, 35(10), 1996, pp. 2824-2829
Citations number
4
Categorie Soggetti
Optics
Journal title
ISSN journal
00913286
Volume
35
Issue
10
Year of publication
1996
Pages
2824 - 2829
Database
ISI
SICI code
0091-3286(1996)35:10<2824:ESFMHI>2.0.ZU;2-#
Abstract
An iterative method is introduced for determining the exposure schedul e for multiplexing holograms in saturable recording materials, such as photopolymers, This method is designed to share all or part of the av ailable dynamic range of the recording material among the holograms to be multiplexed. Using exposure schedules derived from this method, th e authors find that the diffraction efficiency of DuPont's HRF-150 38- and 100-mu m photopolymer scale is (2.2/M)(2) and (6.5/M)(2) respecti vely, where M is the number of holograms recorded. Finally, 1000 holog rams were multiplexed at a single location in the 100-mu m thick photo polymer using an exposure schedule derived with this method. (C) 1996 Society or Photo-Optical Instrumentation Engineers.