MICROGALVANICS - LOCALLY RESOLVED CONCENTRATION MEASUREMENTS WITH ION-SELECTIVE MICROELECTRODES AND CHRONOAMPEROMETRIC MICROELECTRODES

Authors
KUPPER M SCHULTZE JW
Citation
M. Kupper et Jw. Schultze, MICROGALVANICS - LOCALLY RESOLVED CONCENTRATION MEASUREMENTS WITH ION-SELECTIVE MICROELECTRODES AND CHRONOAMPEROMETRIC MICROELECTRODES, Fresenius' journal of analytical chemistry, 356(3-4), 1996, pp. 187-191
Citations number
13
Categorie Soggetti
Chemistry Analytical
Journal title
Fresenius' journal of analytical chemistry → ACNP
ISSN journal
09370633
Volume
356
Issue
3-4
Year of publication
1996
Pages
187 - 191
Database
ISI
SICI code
0937-0633(1996)356:3-4<187:M-LRCM>2.0.ZU;2-4
Abstract
Localized electrochemical analysis in the micrometer-range is useful f or the in situ investigation of galvanic plating processes. Two techni ques are presented, a potentiometric and a chronoamperometric one, usi ng xyz-positionable microelectrodes for practical concentration measur ements in microstructures during cathodic metal deposition. Locally me asured concentration data c(xy) are related to local current density i (xy), which is not obtainable by other means in a system containing ex cess supporting electrolyte.