NARROW TEMPERATURE WINDOW FOR OPTIMUM ELASTIC-MODULUS IN ION-BEAM-MODIFIED AMORPHOUS-CARBON

Authors
Citation
Dh. Lee et Bw. Park, NARROW TEMPERATURE WINDOW FOR OPTIMUM ELASTIC-MODULUS IN ION-BEAM-MODIFIED AMORPHOUS-CARBON, Journal of the Korean Physical Society, 29(5), 1996, pp. 686-689
Citations number
16
Categorie Soggetti
Physics
ISSN journal
03744884
Volume
29
Issue
5
Year of publication
1996
Pages
686 - 689
Database
ISI
SICI code
0374-4884(1996)29:5<686:NTWFOE>2.0.ZU;2-W
Abstract
We have investigated the possibility of superhard C3N4 formation by io n-beam implantation into amorphous carbon. The effect of the implantat ion temperature was examined using 100-keV N+ or 80-keV C+ ions. The a pparent elastic modulus data, measured by nanoindentation with load-di splacement, shows an optimum value of 91.0+/-0.9 GPa at approximately -100 degrees C. This is much higher than that for unimplanted amorphou s carbon, 35.5/-0.3 GPa. Self (carbon) implantation also produces simi lar modulus enhancements within a narrow temperature window. The maxim um elasticity correlates well with an asymmetric diffuse peak around 1 ,500 cm(-1) in the Raman spectra. A lower dose rate is found to furthe r strengthen the elastic modulus.