PHOTOINDUCED FORMATION OF DIMERS AT A LIQUID (001)GAAS INTERFACE/

Citation
Vl. Berkovits et al., PHOTOINDUCED FORMATION OF DIMERS AT A LIQUID (001)GAAS INTERFACE/, Physical review. B, Condensed matter, 54(12), 1996, pp. 8369-8372
Citations number
23
Categorie Soggetti
Physics, Condensed Matter
ISSN journal
01631829
Volume
54
Issue
12
Year of publication
1996
Pages
8369 - 8372
Database
ISI
SICI code
0163-1829(1996)54:12<8369:PFODAA>2.0.ZU;2-7
Abstract
Using reflectance anisotropy spectroscopy (RAS), we show that surface dimers, which so far have only been observed on surfaces in an ultrahi gh-vacuum environment, can exist at semiconductor/liquid interfaces. W e consider here As and Ga dimers at the interface between GaAs and sod ium sulfide solutions. These dimers appear as the result of photochemi cal reactions and are identified by their RA signatures. Their observa tion requires (i) dark treatment of the surface in the solution (1 h) in order to form an overlayer which isolates the surface from the solu tion, (ii) subsequent above band-gap light excitation which induces ph otoassisted breaking of respectively As-related and Ga-related chemica l bonds at the interface between the semiconductor and the protective layer. Analysis of the growth under light excitation of the dimer sign al gives evidence that gallium dimers are created at the expense of ar senic dimers by breaking of chemical bonds between gallium and overlyi ng arsenic atoms.