FLUCTUATION OF SURFACE IN POLISHING PROCESS

Authors
HASEGAWA Y MIYAZIMA S NAMBA Y
Citation
Y. Hasegawa et al., FLUCTUATION OF SURFACE IN POLISHING PROCESS, Fractals, 4(2), 1996, pp. 213-218
Citations number
4
Categorie Soggetti
Multidisciplinary Sciences
Journal title
Fractals → ACNP
ISSN journal
0218348X
Volume
4
Issue
2
Year of publication
1996
Pages
213 - 218
Database
ISI
SICI code
0218-348X(1996)4:2<213:FOSIPP>2.0.ZU;2-B
Abstract
A change of surface pattern of materials during polishing is simulated and analyzed from the fractal point of view. We have proposed a simpl e two-dimensional model for microscopic processes of polishing. We hav e obtained a result that the time dependent fluctuation of surface sca les with the momentum of the polishing particle.