SPUTTERED NI-YTTRIA STABILIZED ZIRCONIA COMPOSITE FILM ELECTRODES FORSOFC

Nickel oxide and 8 mol% yttria stabilized cubic zirconia (YSZ) composi te mms were co-deposited on Al2O3 and YSZ substrates with a reactive s puttering technique in argon and oxygen atmosphere using Ni and YSZ ta rgets and reduced in a gas flow of 96%N-2-4%H-2 at 1000 degrees C for 3 h. The co-sputtering of YSZ and Ni suppressed the growth of Ni grain s and decreased the anodic overvoltage for hydrogen oxidation. The com posite anode is especially attractive as the SOFC operating at lower t emperatures, e.g., 800 degrees C.