L. Zhu et al., SEGREGATION AND PREFERENTIAL SPUTTERING OF AL ON ALPHA-CU0.82AL0.18(100), Journal of physics. D, Applied physics, 29(10), 1996, pp. 2564-2569
Using 1-2 keV He+ and 1.5-3 keV Ne+ beams, the measurement of the firs
t layer composition of alpha-CU0.82Al0.18(100) at room temperature rev
eals a slight enrichment of Al on the surface. The enrichment of Al at
room temperature also was confirmed by analysis using a 2 keV Li+ bea
m. It was found that Al atoms on the surface were preferentially sputt
ered for 1-2 keV He+ and 1.5-3 keV Ne+ beams. The surface concentratio
n of Al increased with temperature in the range 300-620 K due to the c
ombined effect of preferential sputtering, ion beam mixing and Gibbsia
n segregation. An equilibrium sputtering model has been developed whic
h agrees with Al surface concentrations up to 473 K. However, at highe
r temperatures the surface Al concentrations are greater than those pr
edicted by the model, indicating that the surface has not reached sput
tering equilibrium.