CARBON THIN-FILMS THROUGH LASER-ABLATION

Thin carbon films were deposited on silicon substrates at room tempera ture using a 0.355 mu m Nd:YAG laser wavelength at low irradiance in t he presence of argon gas. Various techniques including scanning electr on microscopy, X-ray diffraction and Raman spectroscopy were used to a nalyze the film quality. The influence of the argon gas pressure on th e properties of the films is demonstrated and a correlation with the o ptical emission data is presented.