A BROAD-BEAM COLD-CATHODE PENNING IONIZATION GAUGE ION-SOURCE FOR ION-BEAM-ASSISTED DEPOSITION

A broad beam cold cathode Penning ionization gauge ion source is devel oped for ion-beam-assisted deposition. The ion source is composed of s everal modules and it is 88 mm in diameter and 80 mm in height without any cooling system. The discharge voltage is 500 V. The multiaperture extracted ion beam diameter at the exit is 35 mm. It can be operated de in oxygen, argon, nitrogen, and other gases. The ion energy can be adjusted from 50 to 1500 eV and the maximum extraction current density is above 200 mu A/cm(2). The extracted ion beam is matched to the arc hed rack in different vacuum coaters. Due to the small volume of the i on source, single or multiple sources can be installed according to th e volume of the coaters. (C) 1996 American Institute of Physics.