MODELING OF METAL ELECTRODEPOSITS - ANALYTICAL SOLUTIONS - COMMENT

Citation
Jn. Chazalviel et V. Fleury, MODELING OF METAL ELECTRODEPOSITS - ANALYTICAL SOLUTIONS - COMMENT, Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics, 54(4), 1996, pp. 4480-4481
Citations number
8
Categorie Soggetti
Physycs, Mathematical","Phsycs, Fluid & Plasmas
ISSN journal
1063651X
Volume
54
Issue
4
Year of publication
1996
Part
B
Pages
4480 - 4481
Database
ISI
SICI code
1063-651X(1996)54:4<4480:MOME-A>2.0.ZU;2-O
Abstract
When the equations of ionic motion for electrodeposition in a one-dime nsional cell filled with a dilute binary electrolyte are solved under fixed-boundary conditions, a diffusion-limited current, independent of applied potential, is obtained. This result is well expected in the f ramework of the quasineutrality approximation. In this framework, the assumption by Huang and Hibbert [Phys. Rev. E. 52, 5065 (1995)] of an electrical-migration term in the evolution equation for the concentrat ion is incorrect. However, a term of the same form, though smaller, ma y appear either from the concentration dependence of the mobilities or from an electroosmotic effect if the electrolyte is embedded in a gel or a porous medium.