A NEW-TYPE OF IONOPHORE FOR ION-SELECTIVE FIELD-EFFECT TRANSISTORS

Citation
T. Thami et al., A NEW-TYPE OF IONOPHORE FOR ION-SELECTIVE FIELD-EFFECT TRANSISTORS, Bulletin de la Societe chimique de France, 133(7-8), 1996, pp. 759-764
Citations number
20
Categorie Soggetti
Chemistry Inorganic & Nuclear",Biology,Chemistry
ISSN journal
00378968
Volume
133
Issue
7-8
Year of publication
1996
Pages
759 - 764
Database
ISI
SICI code
0037-8968(1996)133:7-8<759:ANOIFI>2.0.ZU;2-T
Abstract
A phthalocyanine subunit functionalized with three crown-ether macrocy cles and one paraffinic side chain terminated with a carboxylic group has been used for grafting the surface of the gate insulator of a fiel d-effect transistor. This type of structure has been chosen to favor n onlinear ion complexations as previously demonstrated in solution. The chemical means used to graft and substitute the silica surface are de scribed. The effect of various cations (Na+, K+, Cs+ Ca2+, Ba2+) on th e characterics of the ion-selective field-effect transistor (ISFET) is described. A model previously reported in the literature has been use d to rationalize the results.