STUDY ON THE ELECTRONIC-STRUCTURE OF (TI, NI) (0001)AL2O3 INTERFACES BY XPS/

Authors
LIU HX ZHANG HL REN HL OUYANG SX WAN DF
Citation
Hx. Liu et al., STUDY ON THE ELECTRONIC-STRUCTURE OF (TI, NI) (0001)AL2O3 INTERFACES BY XPS/, Huaxue xuebao, 54(9), 1996, pp. 888-892
Citations number
12
Categorie Soggetti
Chemistry
Journal title
Huaxue xuebao → ACNP
ISSN journal
05677351
Volume
54
Issue
9
Year of publication
1996
Pages
888 - 892
Database
ISI
SICI code
0567-7351(1996)54:9<888:SOTEO(>2.0.ZU;2-1
Abstract
The electronic structure of Ti, Ni/Al2O3 interfaces were studied by X- ray photoelectron spectra (XPS) in situ during sputtering. The experim ent results show that in the interface area, for Ti/Al2O3,Ti was oxida ted and Al3+ was reduced; for Ni/Al2O3, Ni has several oxidation state s including the spinel.