Ct. Foxon et Oh. Hughes, NANOMETER PRECISION OF SEMICONDUCTOR MULTILAYER GROWTH, Philosophical transactions-Royal Society of London. Physical sciences and engineering, 354(1717), 1996, pp. 2413-2422
This article discusses the limitations imposed by the molecular beam e
pitaxy (MBE) growth process on the performance of double-barrier reson
ant tunnelling (DBRT) structures. Improved performance by optimization
of the MBE process and appropriate choice of the materials system are
also discussed.