EFFECT OF COPPER ON THE MICROSTRUCTURE AND ELECTROMIGRATION LIFETIME OF TI-ALCU-TI FINE LINES IN THE PRESENCE OF TUNGSTEN DIFFUSION-BARRIERS

A systematic study was performed of the microstructural and electromig ration characteristics of Ti-Al(Cu)-Ti laminate structures fabricated from two metal wiring levels 1 mu wm in width. The total Cu content in the Al(Cu) core layers was varied from 0.5 to 2.0 wt %. A high degree of [111] texture was found for all Cu concentrations except for the 0 .5 wt % film. Grain size statistics were found to be independent of th e Cu concentration. The Al grains were supersaturated with Cu which le d to shifts in resistance during low temperature baking and electromig ration testing. The electromigration lifetime of stripes connected to large reservoirs of Cu and Al was found to be linearly dependent on th e total Cu content, whereas there was a ''roll off'' in the lifetime o f two-level W stud structures as the Cu content was increased. The act ivation energy for electromigration induced failure was found to be 0. 78-0.93 eV. Resistance shifts during electromigration and temperature only stressing and the microstructural characteristics of failed struc tures were explained in terms of the distribution of Cu in the Al matr ix and the geometry of the structures using a blocking boundary model. (C) 1996 American Institute of Physics.