TEMPERATURE-DEPENDENCE OF OPTICAL-PROPERTIES OF THE DEEP SULFUR CENTER IN SILICON

Citation
H. Pettersson et al., TEMPERATURE-DEPENDENCE OF OPTICAL-PROPERTIES OF THE DEEP SULFUR CENTER IN SILICON, Journal of applied physics, 80(9), 1996, pp. 5312-5317
Citations number
20
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
80
Issue
9
Year of publication
1996
Pages
5312 - 5317
Database
ISI
SICI code
0021-8979(1996)80:9<5312:TOOOTD>2.0.ZU;2-Q
Abstract
Spectral distributions of the hole photoionization cross section of th e deep sulfur center in silicon have been measured at 10 different tem peratures within the range 75 K less than or equal to T less than or e qual to 297 K applying the steady-state photocurrent technique, Zero-p honon hole binding energies of the deep donor level have been determin ed at these temperatures by using a detailed numerical fitting procedu re. The temperature dependence of the hole binding energy is well desc ribed by a novel analytical formula with a zero-temperature binding en ergy of 557 meV. Further analysis of our data resulted in a lattice ad justment energy (Franck-Condon shift) of 51 meV and an associated aver age phonon energy of 33 meV. (C) 1996 American Institute of Physics.