PHOTOCHEMICAL PROCESSES IN PHOTORESIST LA YERS BASED ON CRESOL-FORMALDEHYDE RESINS AND ORTHO-NAPHTHOQUINONEDIAZIDES IN THE PRESENCE OF DONOR ADDITIVES

Authors
GRISHINA AD KHAZOVA GO TEDORADZE MG VANNIKOV AV KOLTSOV YI
Citation
Ad. Grishina et al., PHOTOCHEMICAL PROCESSES IN PHOTORESIST LA YERS BASED ON CRESOL-FORMALDEHYDE RESINS AND ORTHO-NAPHTHOQUINONEDIAZIDES IN THE PRESENCE OF DONOR ADDITIVES, ZHURNAL NAUCHNOI I PRIKLADNOI FOTOGRAFII, 41(5), 1996, pp. 6-14
Citations number
12
Categorie Soggetti
Photographic Tecnology
Journal title
ZHURNAL NAUCHNOI I PRIKLADNOI FOTOGRAFII → ACNP
ISSN journal
08696144
Volume
41
Issue
5
Year of publication
1996
Pages
6 - 14
Database
ISI
SICI code
0869-6144(1996)41:5<6:PPIPLY>2.0.ZU;2-M