MATHEMATICAL-MODELING OF IRON ELECTRODEPOSITION ON THE ROTATING-DISK ELECTRODE AT THE PRESENCE OF SURFACE INHIBITOR

A mathematical model of iron deposition on the rotating disk electrode (RDE) in the presence of surface inhibitor is presented. The model de scribes the plating process by incorporating the mass transport of par ticipating ionic species, homogeneous chemical reactions within the di ffusion layer, adsorption phenomena of hydroxyl ion and surface agent, and the associated electrochemical kinetics. Iron deposition rate can be predicted as a function of disk rotation speed, solution pH, bulk concentrations of participating ionic species. It is shown that iron d eposition rate is inhibited in the presence of surface additive due to the less available electroactive area. Model results indicate that hi gher ferrous ion concentration can be preserved at the interface in th e presence of additive so that higher potential can be applied without concentration depletion within the diffusion layer.