A strain of Xanthomonas campestris pv. vesicatoria showing resistance
to 1.2 mM cupric sulfate was analyzed by atomic absorption spectroscop
y and ESI (electron spectrophotometry imaging). Accumulation of copper
was detected in the periphery of the cell membrane region, suggesting
that the mechanism of copper resistance is similar to that previously
described for Pseudomonas species. The ESI technique was used to dete
ct copper in the membrane region. Copper-resistance in X. campestris p
v. vesicatoria 484 is inducible and occurs by accumulation of the meta
l and not by efflux mechanism as has been suggested. The growth curve
also showed that this system is inducible.