Chemical vapor deposition (CVD) from an aerosol generated by ultrasoni
c atomization was used to grow magnesium oxide films on alumina polycr
ystalline substrates. The precursor was a solution of magnesium acetyl
acetonate (Mg(acac)(2)) in isopropanol. The decomposition of the salt
was studied to determine the CVD temperature range. Thermal analysis o
f the salt by thermogravimetry, differential scanning calorimetry and
IR and mass spectrometry enabled a decomposition model of the salt to
be determined. Above the melting temperature at 265 degrees C, Mg(acac
)(2) is no longer stable. The molecule splits giving, on the one hand,
a gaseous organic residue and, on the other, a liquid (MgC5H6O2) whic
h in turn gives rise to MgO at 450 degrees C. The film presents a smoo
th microstructure and a highly preferentially oriented structure with
the (200) planes parallel to the substrate surface at a deposition tem
perature of about 400 degrees C. The thickness obtained reaches 10 mu
m, which represents an effective diffusion barrier on alumina for the
deposition of thick films containing alkaline earth elements.