ELECTRON FIELD-EMISSION FROM DIAMOND TIPS PREPARED BY ION SPUTTERING

Citation
C. Nutzenadel et al., ELECTRON FIELD-EMISSION FROM DIAMOND TIPS PREPARED BY ION SPUTTERING, Applied physics letters, 69(18), 1996, pp. 2662-2664
Citations number
21
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
69
Issue
18
Year of publication
1996
Pages
2662 - 2664
Database
ISI
SICI code
0003-6951(1996)69:18<2662:EFFDTP>2.0.ZU;2-P
Abstract
In this letter we report the field emission from cones etched into a s ynthetic-type IIb (100) oriented boron-doped diamond crystal. The cone s were produced with an ion sputtering process. With a high-resolution scanning electron microscope we found the curvature radius at the end of the cones to be less than 10 nm. The length of these cones is in t he range of 10 mu m giving a field enhancement of approx. 1000. Field emission started at field strength of 2 V/mu m, and at 3.8 V/mu m 10 n A were measured using a spherical anode of 4 mm diam. From a Fowler-No rdheim fit the work function could be deduced to be 3-4 eV. Hence, ele ctrons are emitted from the valence band. (C) 1996 American Institute of Physics.