F. Goldberg et Ej. Knystautas, NITI THIN-FILM CHARACTERIZATION BY RUTHERFORD BACKSCATTERING SPECTROMETRY, Materials science & engineering. B, Solid-state materials for advanced technology, 40(2-3), 1996, pp. 185-189
Nickel and titanium can form alloys showing the shape memory effect wh
en combined in the right stoichiometric proportion (1:1). Recently, su
ch alloys have been produced as thin films by sputtering (RF or DC, wi
th or without magnetron), with a view to making microelectromechanical
actuators. Precise control of the characteristic transformation tempe
rature is crucial for obtaining the shape memory effect. This requires
analytical tools which can accurately determine the relative composit
ion, and hence the transition temperature. In this paper, Rutherford b
ackscattering spectrometry will be shown to meet the requirements of t
hin film processing of NiTi shape memory alloys, and to have advantage
s when compared with other techniques.