ERBIUM-DOPED SILICON AND POROUS SILICON FOR OPTOELECTRONICS

Authors
Citation
Gt. Reed et Ak. Kewell, ERBIUM-DOPED SILICON AND POROUS SILICON FOR OPTOELECTRONICS, Materials science & engineering. B, Solid-state materials for advanced technology, 40(2-3), 1996, pp. 207-215
Citations number
64
Categorie Soggetti
Material Science","Physics, Condensed Matter
ISSN journal
09215107
Volume
40
Issue
2-3
Year of publication
1996
Pages
207 - 215
Database
ISI
SICI code
0921-5107(1996)40:2-3<207:ESAPSF>2.0.ZU;2-9
Abstract
Silicon forms the backbone of the microelectronics industry, and possi bly, of the optoelectronics industry, hitherto dominated by III/V mate rials. One of the remaining goals is to build an optical source in sil icon. Erbium exhibits luminescent 1.54 mu m intra-4f transitions in bo th silicon and porous silicon. This paper reviews the work which has b een carried out in this held and discusses some possible additional ap plications of erbium-doped silicon in optoelectronics, such as a novel on-chip temperature sensor.