OPTICAL-PROPERTIES OF AG ISLAND FILMS PREPARED BY RADIOFREQUENCY MAGNETRON-SPUTTERING USING ATTENUATED TOTAL-REFLECTION METHOD

Citation
T. Wakamatsu et al., OPTICAL-PROPERTIES OF AG ISLAND FILMS PREPARED BY RADIOFREQUENCY MAGNETRON-SPUTTERING USING ATTENUATED TOTAL-REFLECTION METHOD, J. mod. opt., 43(11), 1996, pp. 2217-2224
Citations number
15
Categorie Soggetti
Optics
Journal title
ISSN journal
09500340
Volume
43
Issue
11
Year of publication
1996
Pages
2217 - 2224
Database
ISI
SICI code
0950-0340(1996)43:11<2217:OOAIFP>2.0.ZU;2-7
Abstract
The optical properties of Ag island films deposited on glass substrate s at room temperature by rf magnetron-sputtering have been investigate d. The reflection of p- and s-polarized laser light with a wavelength of 633 nm by the Ag thin films was measured in an attenuated total ref lection (ATR) configuration. The effective dielectric constants epsilo n and effective optical thickness d(opt). Of the films were obtained f rom theoretical fitting of the p-polarized ATR data. The measured ATR curves were very sensitive to metal island structure. For films with a thickness of less than about 16 nm, epsilon was very dependent upon d (opt). and both the real and imaginal parts of epsilon increased consi derably for thinner films.