ANALYSIS OF THE PRIMARY PROCESS IN ISOTOPE SPUTTERING

Citation
Vi. Shulga et P. Sigmund, ANALYSIS OF THE PRIMARY PROCESS IN ISOTOPE SPUTTERING, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 119(3), 1996, pp. 359-374
Citations number
65
Categorie Soggetti
Physics, Nuclear","Nuclear Sciences & Tecnology","Instument & Instrumentation
ISSN journal
0168583X
Volume
119
Issue
3
Year of publication
1996
Pages
359 - 374
Database
ISI
SICI code
0168-583X(1996)119:3<359:AOTPPI>2.0.ZU;2-0
Abstract
Knockon sputtering from Mo isotopic mixtures has been studied by binar y-collision and (in part) molecular-dynamics simulation. Differential and integrated partial sputter yields have been determined for homogen eous, mostly polycrystalline targets. Simulations have been carried ou t on Mo-103-Mo-92 and Mo-100-Mo-50 mixtures and accurate scaling relat ions with mass ratio have been established. The reliability of the sim ulation code was tested by computation of absolute elemental sputter y ields, and the influence of key input parameters on these yields was d etermined. Relative sputter yields of isotopic mixtures do not depend sensitively on most of those parameters, with the notable exception of the target-target interatomic potential, the surface barrier, and the treatment of nonbinary collisions. Most of our simulations refer to A r bombardment, and ion energies covered range from less than 100 eV to 100 keV. At high ion energies sputtering is found to be preferential in the light species in agreement with predictions from transport theo ry, and the magnitude of this effect appears consistent with the few a vailable experimental results. A weak dependence of the yield ratio on emission angle is found which is identified as a surface scattering e ffect. At low ion energies very pronounced preferential sputtering is found which occasionally even may go in the opposite direction, i.e., preferential emission of the heavier species. This effect is governed by threshold processes and characterized by a predominant contribution from primary recoil atoms to the sputtered-particle flux. It is sensi tive to the angle of incidence. Although the relative importance of th reshold processes decreases rapidly with increasing energy their signa tures remain visible at fairly high energies because isotope effects i n higher generations of recoil atoms are weak. In the 1-5 keV range wh ich is important for numerous applications and where most experimental and previous simulational work was carried out, the two types of proc esses compete. This complicates the analysis and explains why it has b een difficult to reconcile discrepancies in the past.