SECONDARY-ELECTRON IMAGING BY MEANS OF A MICROFABRICATED ELECTRON COLUMN

Authors
STEBLER C DESPONT M STAUFER U
Citation
C. Stebler et al., SECONDARY-ELECTRON IMAGING BY MEANS OF A MICROFABRICATED ELECTRON COLUMN, Journal de physique. III, 6(11), 1996, pp. 1435-1439
Citations number
8
Categorie Soggetti
Material Science","Phsycs, Fluid & Plasmas","Physics, Applied
Journal title
Journal de physique. III → ACNP
ISSN journal
11554320
Volume
6
Issue
11
Year of publication
1996
Pages
1435 - 1439
Database
ISI
SICI code
1155-4320(1996)6:11<1435:SIBMOA>2.0.ZU;2-X
Abstract
This letter reports about the application of a miniaturized electron m icroscope for generating scanning secondary-electron images. The emplo yed electrostatic lens-system was fabricated using silicon microfabric ation techniques and a scanning tunneling microscope, operated in the field emission mode, was used as electron source. A resolution of bett er than 100 nm at a beam energy of 200 eV was achieved.