ELECTRICAL CHARACTERISTICS OF METAL ALN/N-TYPE 6H-SIC(0001) HETEROSTRUCTURES/

Metal/A1N/n-type 6H-SiC(0001) heterostructures have been prepared by g rowing wurtzite AIN layers on vicinal 6H-SiC(0001) using gas-source mo lecular beam epitaxy, High-resolution transmission electron microscopy results show that the interface between the AlN layer and the Si-term inated 6H-SiC substrate is microstructurally abrupt, but contains defe cts originating at step sites on the 6H-SiC surface. The interface is found to have a low density of trapped charges of -2 at room temperatu re without any postgrowth treatment. This value is comparable to 1x10( 11) cm(-2) those reported for thermally grown and deposited oxides on n-type 6H-SiC(0001), and indicates the formation of a high quality int erface. (C) 1996 American Institute of Physics.