VISIBLE PHOTOLUMINESCENCE FROM PRESSURE ANNEALED INTRINSIC CZOCHRALSKI-GROWN SILICON

Citation
Gp. Karwasz et al., VISIBLE PHOTOLUMINESCENCE FROM PRESSURE ANNEALED INTRINSIC CZOCHRALSKI-GROWN SILICON, Applied physics letters, 69(19), 1996, pp. 2900-2902
Citations number
11
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
69
Issue
19
Year of publication
1996
Pages
2900 - 2902
Database
ISI
SICI code
0003-6951(1996)69:19<2900:VPFPAI>2.0.ZU;2-X
Abstract
Visible luminescence from thermal treated intrinsic Czochralski-grown silicon is reported. Oxygen precipitates were formed in a nearly overs aturated silicon by a two-step thermal treatment with auxiliary use of high pressures. A wide photoluminescence band peaked at about 2.3 eV is observed in those samples for which the first treatment was perform ed at a relatively high temperature and which show a higher amount of oxygen precipitates and oxygen related defects. Scanning electron micr oscopy of the best performing samples show the presence of submicron c onglomerates on the surface. We have tentatively attributed the lumine scence emission to the defects in the suboxide SiOx phase formed in th e oxygen precipitates. (C) 1996 American Institute of Physics.