ROOM-TEMPERATURE NORMAL-MODE COUPLING IN A SEMICONDUCTOR MICROCAVITY UTILIZING NATIVE-OXIDE ALAL GAAS MIRRORS/

Citation
Tr. Nelson et al., ROOM-TEMPERATURE NORMAL-MODE COUPLING IN A SEMICONDUCTOR MICROCAVITY UTILIZING NATIVE-OXIDE ALAL GAAS MIRRORS/, Applied physics letters, 69(20), 1996, pp. 3031-3033
Citations number
20
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
69
Issue
20
Year of publication
1996
Pages
3031 - 3033
Database
ISI
SICI code
0003-6951(1996)69:20<3031:RNCIAS>2.0.ZU;2-M
Abstract
A GaAs/AlAs microcavity containing six InGaAs quantum wells was grown, and the sample was then etched via chemically-assisted ion-beam etchi ng to form 50-mu m-diam cylindrical mesas, The formation of native oxi des, accomplished by baking the samples at 400 degrees C in the presen ce of a pressurized N-2/H2O Vapor line, lowered the refractive index o f the AlAs layers to 1.5. The higher refractive index contrast more ef fectively confined the intracavity held, leading to well-resolved refl ectivity dips with an exciton-polariton splitting of 6.72 nm=9.44 meV at room temperature. (C) 1996 American Institute of Physics.